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- In this paper, CIO thin film was prepared by DC reactive magnetron sputtering method in JGP450 type high vacuum magnetron sputtering apparatus, the surface morphology and structure of the CIO thin film were analyzed by AFM, XRD and XPS. 本文在JGP450型高真空磁控溅射台上,采用直流反应磁控溅射法制备了CIO薄膜,用AFM、XRD和XPS分析了样品的表面形貌、组织结构、化学态和元素价态。
- The W/B4C X-ray periodic multilayer films with small period (d=4.2nm) are fabricated by the high vacuum magnetron sputtering technology, and its structure was measured by D1 XRD from BEDE Company, UK. 采用高真空磁控溅射技术,实现不同周期的W/B4C周期多层膜的制备。 利用英国BEDE公司出产的D1高分辨X射线衍射仪,完成W/B4C周期多层膜周期结构的测量。
- Investigation on high vacuum magnetron sputtering IrMn top spin valve 磁控溅射法制备IrMn顶钉扎自旋阀研究
- APPLICATION OF MULTIPLE PLASMA ARC DISCHARGE VACUUM MAGNETRON SPUTTERING COATING PLANT IN CERAMIC SURFACE DECORATION 磁控等离子多弧真空溅射镀膜机在陶瓷表面装饰的应用
- Transfer motion control of sponge coil during vacuum magnetron sputtering film coating 海绵卷绕真空磁控溅射镀膜过程中的传动控制
- vacuum magnetron sputtering 真空磁控溅射
- The optimum method for preparing TiNi thin films is magnetron sputtering (the parameter is: electrical current 0.6 A, vacuum 0.6 Pa, Ar flux 25 SCCM ). 在本实验条件下优选出来的制膜方法为磁控溅射法;工艺参数为溅射电流0.;6 A;真空度0
- IrMn top spin valves,with a structure of Ta/NiFe/CoFe/Cu/CoFe/IrMn/Ta,were deposited on glass and silicon substrate by high vacuum DC magnetron sputtering. 在玻璃和硅衬底上利用高真空直流磁控溅射的方法淀积了结构为Ta/NiFe/CoFe/Cu/CoFe/IrMn/Ta的IrMn顶钉扎自旋阀薄膜。 分别研究了增加磁电阻率,降低矫顽力和提高交换场的方法。
- P. Nunes, D. Costa, E. Fortunato and R. Martins, “Performances presented by zinc oxide thin films deposited by r.f. magnetron sputtering,” Vacuum, vol. 64, pp. 293-297, 2002. 水瑞鐏，”氧化锌薄膜特性及其在通讯元件与液体感测器上之应用”，国立成功大学电机工程学系博士论文，(2002)。
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel. 用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。
- A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。
- Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering. 采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜。
- This system can be used either as multi-arc or magnetron sputtering PVD individually. 也可以单独作为磁控溅射或多弧离子镀膜机使用。
- AlN films with special function and excellent structure can be grown under proper conditions by magnetron sputtering. 采用磁控溅射技术,可以选用在适当的条件下制备具有特定功能与结构优良的氮化铝薄膜。
- Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering. 摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属/氟化高聚物复合薄膜。
