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flame CVD method 火焰CVD法
CN x films were deposited on the Si(100) substrates with microwave plasma CVD method. 沉积在Si（100）基片上的CNx膜是用微波等离子体化学气相沉积法（MWPCVD）制备的。
WT5BZ]Using H 2,CH 4,BCl 3 as raw materials,carbon fibers were coated with B 4C by CVD method. 以 H2 ,CH4,BCl3为原料气 ,用化学气相沉积 (CVD)法在碳纤维表面连续涂覆 B4C。
For the titania syntheses by a flame CVD process, the mean particle size has been calculated by the kinetic theory at different positions in the reactor and different operational conditions. 本文采用火焰CVD法制备纳米颗粒,针对其制备纳米颗粒材料过程中颗粒碰撞长大现象,发展了火焰CVD法制备纳米颗粒材料过程的动力理论。
The diamond films doped with boron were synthesized on the Si 3N 4 substrate by microwave plasma CVD method (MPCVD). 采用微波等离子体化学气相沉积 ( MPCVD)的方法在 Si3N4 基片上制作了掺硼金刚石薄膜。
The TiC coating on the surface of carbon/carbon composites was prepared by CVD method. 用化学气相沉积法 (CVD)在碳 /碳复合材料表面沉积 Ti C涂层。
In this paper,a great deal of high property carbon microspheres were prepared by CVD method. 采用化学气相沉积(CVD)法,制备出大量的高性能碳微球。
The chemical composition, crystal structure and gas sensitive character of the thin SnO_2 films by CVD method have been studied. 研究了用化学气相淀积方法制备的SnO_2薄膜的组成。
The TaC coating and C-TaC composite coating on the surface of carbon/carbon composites were prepared by CVD method in TaCl_5-C_3H_6-H_2-Ar system. 利用TaCl52C3H62H22Ar反应体系,用化学气相沉积法(CVD)成功地在C/C复合材料表面沉积TaC涂层及C2TaC复合涂层。
This article describes thin films depositi on mechanism by CVD method, and applied characteristic of these films in ULSI. 介绍了在超大规模集成电路制造工艺中，用化学气相（CVD）方法淀积各种薄膜的反应机理和特性，及这些薄膜在器件制造工艺中的应用。
B-doped diamond films were grown on graphite substrates by hot filament assisted CVD method (HFCVD).The dopant was solid B_2O_3. 采用固体三氧化二硼,用热丝辅助化学气相沉积法在石墨衬底上沉积了掺硼金刚石涂层。
Nanocrystalline free-standing diamond films were deposited by 30kW DC Arc Plasma Jet CVD method on Molybdenum substrate with mixed fed gasses of Argon, Hydrogen and Methane. 在30kW级DC Arc Plasma Jet CVD(直流电弧等离子体喷射化学气相沉积)设备上,采用Ar-H2-CH4混合气体,在Mo的衬底上沉积出纳米金刚石自支撑膜。
Carbon nanotube films grown on nickel sheet by CVD method were directly used for the electrode materials of capacitive deionization device(CDD). The surface structures of carbon nanotube films were characterized by FESEM,TEM and BET. 采用低压CVD法制备得到的金属镍基碳纳米管薄膜直接作为电容去离子器(CDD)的电极材料,并对碳纳米管薄膜进行了扫描电镜观察和比表面与孔径分析,探讨了该电极材料的电容吸附性能。
Synthesis of Multiwall carbon nanotubes by CVD Method need the following main equipment: fixed catalytic bed, boiling catalytic bed, spray catalytic bed, two-temperature fluidized catalytic bed, etc. CVD法制备多壁碳纳米管主要的实验装置有固定催化床、沸腾催化床、喷淋催化床、双温区流动催化床等；
Synthesis of Multiwall carbon nanotubes by CVD Method need the following main equipment: fixed catalytic bed,boiling catalytic bed,spray catalytic bed,two-temperature fluidized catalytic bed,etc. CVD法制备多壁碳纳米管主要的实验装置有固定催化床、沸腾催化床、喷淋催化床、双温区流动催化床等;
Study on Synthesizing Thick Diamond Films by the Combustion Flame CVD 燃焰法CVD金刚石厚膜制备工艺研究
This paper reviews fluorides CVD methods for refractory metals in CIS countries, including modern development of the equipment and products. 介绍了独联体国家难熔金属氟化物化学气相沉积的工艺、设备及其产品的开发情况和研究进展。
He ran into an old flame of his at the supermarket. 他在超级市场碰见了他的一个老相好。
I add the coal on the flame continuously. 我不断朝火里添加煤炭。
The method seems good but it needs to be tried out. 这个方法似乎不错，但需要试验一下。