Nanocrystalline free-standing diamond films were deposited by 30kW DC Arc Plasma Jet CVD method on Molybdenum substrate with mixed fed gasses of Argon, Hydrogen and Methane.

• 在30kW级DC Arc Plasma Jet CVD(直流电弧等离子体喷射化学气相沉积)设备上,采用Ar-H2-CH4混合气体,在Mo的衬底上沉积出纳米金刚石自支撑膜。