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Titanium nitride films were grown by unbalanced magnetron sputtering at different N2 and Ar partial pressure ratios on Ti6Al4V alloy substrate. 采用非平衡磁控溅射技术,在钛合金(Ti6Al4V)表面沉积氮化钛薄膜。通过改变氮气和氩气分压比(PN/PAr)和基体偏压,制备出不同结构、性能的氮化钛薄膜。
Titanium nitride films were deposited on silicon(100) substrate at room temperature with various substrate bias voltages (corresponding to various impact energy) by energetic cluster impact (ECI). 在室温下，以硅（100）为衬底，在不同的衬底偏压（即团簇不同碰撞能量）的条件下，用荷能团簇碰撞沉积方法制备了TiN薄膜。
Microstructures and Properties of Titanium Nitride Film Grown by Unbalanced Magnetron Sputtering 非平衡磁控溅射氮化钛薄膜及其性能研究
Titanium nitride film 口腔正畸
titanium nitride film resistor 氮化钛膜电阻器
Morphology and Physical Properties of Titanium Nitride Films Deposited by Magnetron Sputtering at Room Temperature 室温直流磁控溅射氮化钛薄膜研究
Study on the Preparation of Hard and Wear-resistant Titanium Nitride Films on Silicon Nitride Ceramic Cutting Tools 氮化硅陶瓷刀具表面涂覆高硬耐磨氮化钛涂层研究
A Comparison on Structural and Tribological Properties of Diamond-like Carbon and Titanium Nitride Films 类金刚石碳膜和氮化钛的摩擦学性能研究
Titanium nitride offers the customer wear protection in jet engine bearings. 氮化钛提供了客户的抗磨损保护的喷气发动机轴承。
X-ray diffraction (XRD) measurements reveal formation of titanium nitride in the astreated sample. 利用X射线衍射仪(XRD)对氮化处理后的样品刚试，得到了样品的相结构。
The invention relates to a manufacturing method of a titanium nitride layer as well as an apparatus thereof. 本发明涉及一种氮化钛层的制造方法及其装置。
It is also used as the etchant for etching Aluminum and Silicon Nitride film in semi-silicon IC. 在硅平面晶圆集成电路生产中，用于铝及氮化硅的蚀刻；
Based on the preparation of titanium nitride, the effects for the choice of the precursor on the CVD systems have been illustrated. 摘要本文以氮化钛的CVD制备为例，说明了源物质的选择对CVD过程的影响。
It shows that even if using the RF power(13.56 MHz) as the excitation of plasma,the compressive silicon nitride film can be obtained easily. 通常认为高频下制备得到的氮化硅膜呈现张应力;但是通过实验;表明即使应用高频(13.;56MH z)作为激励源同样可以沉积出呈现压应力的氮化硅薄膜。
All imported (Austria), cobalt high-speed steel. Co-Steel after titanium nitride coating materials, the best use of state properties. 全部采用进口（奥地利）钴高速钢。钴高速钢材料经过氮化钛镀层，达到最佳使用性能状态。
This equipment adopts the titanium nitride metal mixing techs forming ion gold membrane with good abrasion resistance, therefore it fits for various top-grade decorating membrane. 该设备采用氮化钛表面掺金技术,形成离子金膜层,耐磨性非常好,广泛用于各种高档装饰膜层。
Hard and wear-resistant titanium nitride coatings were deposited by pulsed high energy density plasma technique on silicon nitride ceramic cutting tools at ambient temperature. 用高能量密度脉冲等离子体于室温下在氮化硅陶瓷刀具上成功沉积了高硬耐磨的氮化钛涂层。
Recently, he is working on one national project and two local project on biocompatibility and bactericidal properties for titanium nitride nanofilm and pyrolytic carbon materials. 现正承担两项天津市自然科学基金项目和一项国家自然科学基金项目，从事钛陶瓷纳米膜和热解碳材料的生物相容性和抗菌性研究。
In this paper, a quantitative friction measurement technique is introduced.The friction coefficients between a silicon tip and titanium nitride and diamond-like-carbon films have been obtained. 本文介绍定量摩擦力测量技术，并测量矽探针与氮化钛及类钻碳两种硬膜的摩擦系数。
That was infinitely better than his last film. 这比他上一部电影不知胜过多少倍。