The present invention discloses a producing method for a photomask and a thin-film transistor basal plate. 本发明公开了一种光掩模及薄膜晶体管基板的制造方法。
Compared with the well known manufacturing method of a pixel structure, the invention can simplify processing steps and reduces the manufacturing cost of photomask. 本发明相比于公知的像素结构制作方法，可以简化工艺步骤并减少光掩模的制作成本。
美
['foʊtoʊmɑːsk]
