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The Contact Interface and Surface Characters between Multiarc Ion Plating TiN and Different Base Materials 多弧离子镀TiN与不同金属基材间的接触界面与表面特性
multiarc ion plating 多弧离子镀
NiCrAlY coating was deposited on Ti6Al4V substrate by arc ion plating (AIP). 采用电弧离子镀(AIP)技术在Ti6Al4V基体表面沉积制备了NiCrAlY涂层。
NiCrAlY coatings were deposited on superalloy IC-6 by arc ion plating (AIP). 采用电弧离子镀技术在IC-6高温合金上沉积NiCrAlY涂层.
Cathodic arc ion plating (CAIP) has been widely applied in modern technology field. 多弧离子镀在现代科技领域中有着广泛的应用。
KEYWORDS : GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
Abstract Plasmas in Multi-Arc Ion Plating(MAIP) are made up of glow and arc plasma. 多弧离子镀中的等离子体是由辉光等离体和弧光等离子体迭加而成的。
Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source. 多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating ， medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
The question of "dimple" during the process of HCD ion plating deposition was discussed. 有负偏压时沉积的薄膜比无负偏压时沉积的薄膜具有更好的机械性质。
The advantages of ion imitating gold electroplating , process sorts and properties of common imitating ion plating deposits were summarized. 对离子仿金电镀工艺的优点、常用仿金离子镀镀层的种类和性能进行了概括。
Abstract: This paper introduces the application and development of ion plating, ionodialysis, ion implantation and the compound technology. 文摘:介绍了离子镀、离子渗、离子注入及其复合工艺的应用与发展。
Gradient(Ti,Al) N coating was deposited on 1Cr11Ni2W2MoV stainless steel for aero-engine compressor blades by arc ion plating. 利用电弧离子镀技术在航空发动机压气机用1Cr11Ni2W2MoV在不锈钢上沉积了(Ti;Al)N梯度涂层.
This paper introduces the application and development of ion plating, ionodialysis, ion implantation and the compound technology. 介绍了离子镀、离子渗、离子注入及其复合工艺的应用与发展。
The influences of many factors on substrate temperature have been studied in detail during arc ion plating (AIP) in this paper. 采用该计算模型分析了基体材质、形状与电弧离子镀膜工艺参数改变时基体温度的变化,经实验验证,模型计算与实验数据基本吻合。
Ni-Cr-Al-Y and Ni-Co-Cr-Al-Y coating were prepared on the new type superalloy IC-6 by arc ion plating (AIP). The study was carried on the elemental behavior of ,MCrAlY coating. 本文采用电弧离子镀在新型Y′-Ni_3Al基高温合金IC-6上沉积Ni-Cr-Al-Y和Ni-Co-Cr-Al-Y涂层,研究了MCrAlY涂层元素的行为。
ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。
In this paper,a physical model about the effect of composition demixing between alloy coatings and alloy cathode material in multi arc ion plating is proposed. 提出了一种关于多弧离子镀合金涂层成分离析效应的物理模型。
Semiconductor industry： Sputtering system, Vacuum deposition system, Ion plating system, Electron beam process, Vacuum packaging machine, Device handling system. 半导体行业：薄膜制备设备、器件封装设备、各种排气装置等；
Black TiN coating was prepared by multi-arc ion plating technology, and wear resistance, corrosion resistance, heat-proof property and absorption property of solar spectrum were also discussed. 摘要介绍了利用多弧离子镀工艺制备黑色氮钛膜，并对其耐磨损、耐腐蚀、热稳定性及太阳光谱吸收等性能进行了研究。