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dry etching reactor 干腐蚀反应器
The principle and the main parameters of the dry etching for silicon dioxide are introduced. 摘要阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数。
To approach as a resist in dry etching processing, etching properties of the films in oxygen plasma have been investigated. 为了探索该种薄膜在干刻蚀工艺过程中用作掩膜的可能性，还研究了它在氧离子体中的刻蚀性能。
With the principles and processes of photolithography,dry etching and wet etching,the fabrication of the head slider were experimented. 然后利用光刻、湿法刻蚀和干法刻蚀的工艺及设备,分别进行了该磁头滑块结构的湿法和干法刻蚀试验,给出了刻蚀参数及所加工的磁头照片;
PI (6FDA/BAPS) and PI (DSDA/HFBAPP) are verified including structure, viscosity, sensitivity, contrast, thermostabibity, dry etching resistance and other lithography parameters. 将合成之PI(6FDA/BAPS)与PI(DSDA/HFBAPP)做一连串基本性质鑑定与微影性质测试，结果证明此二种聚亚醯胺都具有优良电子束阻剂之特性。
In addition, we reduced the air columns around the cavity and simulated the photonic bandgap and fabricated the devices by E-beam lithography and deep dry etching process. 未来将会对共振腔的几何形状做修正来符合光传播时的场型，并以此设计做出元件并加以量测。
radial flow plasma etching reactor 径向两等离子体腐蚀装置
After two layers of SiO2/ SiON with different refractive are finished, the designed mask pattern is printed on the film by photolithography, then through ICP for dry etching, the waveguide structures are obtained, for example AWG/EDG we obtained. 两层不同折射率的二氧化硅/氮氧化硅薄膜制备好后，再根据设计好的波导图形，经过光刻，感应耦合等离子体刻蚀(ICP)等工艺，制成所需要的光波导器件，如本研究中心制成的AWG、EDG等。
A dry etch technology for poly-silicon using Cl2, SF6 and N2 mixed gas has been developed on Tegal 1512e. Different effects of positive resist mask for LDD and SiO2 mask for SST on the process are discussed. 在Tegal1512e设备上,采用Cl_2、SF_6、N_2混合气体,开发了多晶硅干法腐蚀工艺,讨论了LDD的正胶掩膜及SST的SiO_2掩膜对工艺的不同影响。
Particulates can emanate from process equipment (E.G., in CVD and etch reactors)as well as from humans (From street clothes, skin flakes, etc. 尘粒也能由工艺设备（如化学气相淀积和刻蚀反应器）以及工作人员（身穿的外套，体表的皮屑等）而产生。
Fabrication of Field Emitter Array with Dry Etching 干法刻蚀制作场发射阴极阵列
Dry etching for high aspect ratio microstructures 深高宽比微结构的干法刻蚀
Research of dry etching simulator in micromachining 微加工干法刻蚀工艺模拟工具的研究现状
New Development in Dry Etching of GaN 氮化镓干法刻蚀研究进展
A reactor is a container for chemical reaction. 反应器是进行化学反应的容器。
Our first atomic reactor was built in1958. 我们第一个原子反应堆建于1958年。
The reactor was built for tame atomic energy use. 这座反应堆是为原子能的安全使用而建造的。
That is a beautiful etching of a bird. 那是一只鸟的漂亮的蚀刻画。
I dry my hands and face with the towel. 我用毛巾擦干了双手和面部。
The old well was bricked up when it ran dry. 旧井干枯以后被人用砖堵上了。