After two layers of SiO2/ SiON with different refractive are finished, the designed mask pattern is printed on the film by photolithography, then through ICP for dry etching, the waveguide structures are obtained, for example AWG/EDG we obtained.

• 两层不同折射率的二氧化硅/氮氧化硅薄膜制备好后，再根据设计好的波导图形，经过光刻，感应耦合等离子体刻蚀(ICP)等工艺，制成所需要的光波导器件，如本研究中心制成的AWG、EDG等。