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Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
Electrochromism of WO3 Films Deposited by Mid-Frequency Dual-Target Magnetron Sputtering Method[J]. 引用该论文王丽阁;胡远荣;李国卿;谢为.
In this paper, CIO thin film was prepared by DC reactive magnetron sputtering method in JGP450 type high vacuum magnetron sputtering apparatus, the surface morphology and structure of the CIO thin film were analyzed by AFM, XRD and XPS. 本文在JGP450型高真空磁控溅射台上,采用直流反应磁控溅射法制备了CIO薄膜,用AFM、XRD和XPS分析了样品的表面形貌、组织结构、化学态和元素价态。
Pb(Zr0.52Ti0.48)O3 (PZT) and (Ba0.7Sr0.3)TiO3 (BST) ferroelectric thin films with distinct perovskite microstructure were prepared by RF magnetron sputtering method ,following a rapid thermal annealing (RTA) process. 应用射频磁控溅射方法;利用快速热退火(RTA)工艺;分别制备出了具有良好铁电性能的 Pb(Zr0.;52Ti0
At present, they have various deposition methods for prepared VO2 films and reactive magnetron sputtering method is relatively perfect. 目前制备VO2膜有许多方法，但比较理想的方法是采用磁控溅射法。
Deposition of NbN films with reactive magnetron sputtering method NbN薄膜的反应磁控溅射沉积
Characteristic Comparison of Coating Metal on Cenospheres by Chemical Method and Magnetron Sputtering Method 空心微珠表面磁控溅射和化学镀金属膜的特性比较
Tribological Properties of Graphite-Like Carbon Coating Prepared by Unbalanced Magnetron Sputtering Method 非平衡磁控溅射沉积类石墨膜及其摩擦磨损性能研究
Plating metal film on the surface of particles using magnetron sputtering method 微颗粒表面磁控溅射镀金属膜实验
Preparation of Ti Alloy Films Containing He by Magnetron Sputtering Method and Thermodesorption Research for He in the Films 磁控溅射法制备含氦钛膜及膜中氦的热解吸研究
Keywords inorganic non-metallic materials;AZO thin films;magnetron sputtering method;making atmosphere;Anneal temperature; 无机非金属材料;AZO薄膜;磁控溅射法;制备气氛;退火温度;
Magnetron sputtering method 磁控溅射法
Structure Characterization of Vanadium Oxide Thin Films Prepared by Magnetron Sputtering Methods 磁控溅射制备的氧化钒薄膜的结构研究
Studies of vanadium pentoxide thin films prepared by R.F. Magnetron sputtering methods 磁控溅射制备五氧化二钒薄膜的研究
The optimum method for preparing TiNi thin films is magnetron sputtering (the parameter is: electrical current 0.6 A, vacuum 0.6 Pa, Ar flux 25 SCCM ). 在本实验条件下优选出来的制膜方法为磁控溅射法;工艺参数为溅射电流0.;6 A;真空度0
Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文朱勇;顾培夫;沈伟东;邹桐.
The SnO2/CeO2 thin film was prepared by powder sputter method. 利用粉末溅射,研究了 SnO2/CeO2微型平面薄膜。
ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。
Magnetron sputtering is a widely used method for thin flint deposition in recent years, which makes a great impact on the industrial production and scientific research. 摘要近年来磁控溅射技术的应用日趋广泛，在工业生产和科学研究领域发挥巨大作用。
Magnetron sputtering is a widely used method for thin film deposition in recent years,which makes a great impact on the industrial production and scientific research. 近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。