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- Compared with metal films deposited by sputter, deposition rate of metal film deposited by pulsed laser deposition (PLD) is much lower, because their deposition mechanism is different. 与溅射法沉积金属薄膜相比,脉冲激光的沉积率要低得多,这是因为两者沉积机制不同。
- Film deposition rate 沉积速度
- Rainfall will greatly enhance the deposition rate. 而下雨亦可增加沉降率。
- Each gallium oxide thin film prepared in different deposition rate has its own optimal operation temperature. 不同的蒸镀速度所制备之氧化镓薄膜,有不同的最佳感测温度。
- We found that sputtering pressure and sputtering time determine the deposition rate and thickness of the A1 film, respectively. 溅射气压和时间分别影响铝层在氟塑料表面的沉积速率和生长厚度。
- The results show that this proposed model is suitable for simulating the film deposition in LPCVD reactor under various TEOS feed flow rate, wafer production rate and machine platform. 最后由模拟结果可以得知,本文所提出的物理模式可应用于不同的反应晶圆片数、不同的反应物进料流量和不同的操作机台上。
- Oita, M., Matsuoka, M. and Iwakura, C., “Deposition rate and morphology of electroless copper film from solutions containing 2, 2’-dipyridyl,” Electrochimica Acta, Vol.42, pp. 1435-1440, 1997. 郑俊麟,“探讨半导体金属化制程之金属钽薄膜的沉积与化学添加剂对铜沉积之影响”,硕士论文,私立中原大学化学工程研究所,桃园,第9-10页,2002。
- That all ensures you can get the most davnced film deposition machine in our company . 先进的技术,保证了我公司的技术设备具有世界超一流的水准。
- The thin film deposition can control precisely the height of the step and can obtain smooth surface. 薄膜沉积法具有精确控制台阶高度及台阶表面较光滑的优点。
- The relationship between the flow rate of Freon (CCI2F2) and deposition rate and efficiency is obtained. 本文研究了不同掺氟量对沉积速率及沉积效率的影响;得出了氟利昂流量与沉积速率及沉积效率之间的变化规律;并试验了沉积温度、热区宽度对掺氟的影响.
- Ensinger W.Ion Source for ion beam assisted thin film deposition[J].Rev.Sci.-Instrum.1992,63(11):5217. 潘永强;朱昌;陈智利;等.;端部霍尔离子源工作特性及等离子体特性研究[J]
- The results showed that KI was a highly efficient stablizer with constant deposition rate in a very wide content range. 结果表明 :碘化钾是一种很有效的稳定剂 ,并且在极宽的浓度范围内可使镀液稳定 ,镀速基本保持不变 ;
- When the temperature difference between crude oil and wall of pipeline is same,the wax deposition rate is different. 在原油与管壁温差相同时,不同温度段蜡沉积速率并不相同,存在蜡沉积高峰区。
- Recently, various magnetron sputtering lines for thin film deposition on large-size glass substrate grow rapidly and attract significant attention. 摘要近年来,各种工业生产规模的玻璃基片大平面磁控溅射生产线发展迅速,令人关注。
- The purpose of this article was to increase the deposition rate of mickel plating so as to improve the productivity. 为提高电镀镍的沉积速率以提高劳动生产率,采用自行研制的离心高速电镀镍装置。
- DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition. 衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
- Abstract: Effects of accelerating agent A 1 on deposition rate and stability of EN soln. 摘 要: 研究了加速剂A 1对化学镀镍反应速度、稳定性及镀层耐蚀性的影响。
- Under otherwise equal conditions, the film deposition ratio by UMS is higher and more influenced with working gases pressure than by MS. 相同工艺条件下,非平衡模式下薄膜沉积速率高于平衡模式,且更易受到氩气流量变化的影响。
- The deposition rate,morphologies,breakdown voltage and refractive index were studied. 研究了制备工艺对薄膜沉积速率、表面形貌、折射率和电击穿场强的影响。
- Progress in organic-inorganic layered perovskite materials about their structures, thin film deposition techniques and properties were summarized. 摘要概述了层状类钙钛矿有机-无机分子组装材料的结构、成膜方法以及性能的研究进展,并分析了影响其结构和性能的部分因素。