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- CF4等离子体 CF4 plasmas
- CF4分解反应 CF4 decomposition
- 本文利用色谱 质谱联用技术对NF3中微量CF4进行了测定。 Detection trace CF 4 in NF 3 by GC/MS was discussed in this paper.
- 用苯 (C6H6)和四氟甲烷 (CF4 )混合气体作源气体 ,用微波电子回旋共振等离子体化学气相沉积技术制备了含氟非晶碳膜 (a C :F)。 a C:F thin films are deposited by microwave electron cyclotron resonance plasma chemical vapor deposition(ECR CVD)using CF 4 and C 6H 6 as source gases.
- 等离子体的分解 disassembly of the plasma
- 等离子体光谱 plasma spectrum
- 实验表明,CF4对硅片的处理不仅可以激活表面,而且可以对硅片表面进行有效的抛光,大大加强了预键合的效果。 The experiments show that CF4 treatment to silicon wafers can not only activate them but also polish their surfaces effectively,and it can improve the pre-bonding greatly.
- 固体中的等离子体振荡 plasma oscillation in solids
- 等离子体中的反常输运 anomalous transport in plasmas
- 等离子体中的粒子碰撞 collision between particles in plasma
- 等离子体微观不稳定性 microinstability of plasma
- 等离子体中X射线激光传输与电子密度诊断的理论及数值比较 Propagation of X-ray in the plasma and compare of analytical and simulative solutions about the diagnostics of electric density of plasma
- IRIS/AP型电感耦合等离子体光谱仪激发光源常见故障分析 The common trouble analyse of igniting light source of model IRIS/AP ICP inductively coupled plasma spectrometer
- 工艺参数对射频磁控溅射PTFE靶形成的等离子体组成的影响 The Effect of Process Parameters on Plasma Environment of RF Magnetron Sputtering PTFE Target With Negative Pulse- Voltage Bias
- 等离子体子激发 plasmon excitation
- 弱电离等离子体 weakly ionized plasma
- 舢等离子体 aluminum plasma
- DBD等离子体 DBD plasma
- ECR等离子体 ECR plasma
- Ar等离子体 Ar plasma
