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pulsed plasma source 脉冲等离子体震源
The key to the technology is the gridless plasma source(GIS). 该技术核心是无栅等离子体源(GIS)。
A novel pulse plasma light source stimulated by a pulsed sinusoidal high frequency supply is reported,and a commercial PS plate is successfully exposed. 本文报道了一套采用正弦脉冲高频电源激励的新型氮气等离子体光源,首次获得了光源的准脉冲输出,并成功的对一种超感度PS版进行了曝光。
Igniter system is one of the key components in pulsed plasma thruster (PPT).It ignites the main discharge of the capacitor and influences the performance of PPT. 摘要点火回路引燃脉冲等离子体推力器的主电容放电，是推力器的关键部分之一，其性能直接影响到推力器运行的成败。
Combined with inductive coupled plasma source, MS can determine if water is polluted by elements like As or Pb. 结合电感等离子离子源，质谱是水中重金属等元素的检测的标准方法。
This is accomplished by the use of an inductively coupled plasma source, usually argon. 这可通过电感藕合等离子体光源通常是氩气来实现。
ZrN thin films were prepared on 45# steel by using ECR-microwave plasma source enhanced deposition. 利用ECR-微波等离子溅射沉积技术不同偏压下在45%23钢基体上制备了ZrN薄膜。
The results show that the ECR plasma source may generate stable, high density plasma with low electron temperature. 实验证明，ECR等离子体源能够稳定地产生电子温度较低的高密度等离子体。
At last, the theories of these spark plugs were analyzed and an optimized spark plug structure was obtained.This research will be of benefit for the reliable operation of pulsed plasma thruster. 最后分析了三种火花塞的点火机理，获得了较好放电性能的火花塞结构形式，为脉冲等离子体推力器的稳定运行提供了重要的依据。
In this paper, we fulfill this aim by using an ECR plasma source to create the plasma. 本研究利用ECR等离子体源在一个大型真空装置中来实现模拟低地球轨道空间等离子体环境。
Chemical vapor deposition of hard diamond-like carbon (DLC) films was achieved using an inductively coupled plasma source (ICPS). 本文采用感应耦合等离子体源(ICPS)成功地实现化学气相沉积硬质类金刚石(DLC)膜,并考察了基片负偏压对类金刚石膜沉积过程和薄膜性质的影响。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. 摘要利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了矽膜。
Diamond films had been deposited on quartz tube with the gas mixture of ethanol steam and hydrogen by the plasma source. 使用该等离子体源以乙醇蒸汽和氢气为气源在石英玻璃管外表面沉积金刚石膜。
The plasma flow stream along the divergent magnetic field in an electron cyclotron resonance(ECR) plasma source has been simulated. 本文建立了一个物理模型，编写了数值程序，模拟了微波电子回旋共振（ECR）等离子体流的特性。
repetitively pulsed plasma accelerator 重复脉冲等离子体加速器
Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
AC middle frequency pulsed plasma power supply 中频交流脉冲等离子体电源
Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
ECR plasma source consists of electrical soure,deflation system,air feed system,electron tube etc.For study purpose,It also includes a measurement &control system. ECR等离子源主要由电源系统、抽气系统、供气系统、真空室等设备组成,对于研究型设备,还包括测控部分。
Analysis of electrode material effect on organic exhaust gas decomposition by pulse plasma. 电极材料对脉冲等离子体降解有机废气的影响分析。