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- plasma etching chamber 离子腐蚀室
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- SCD developed the first vacuum etching machine in china,with vacuum flood bar in the etching chamber;no pool effect;etching factor is up to 4.0. 简要说明：SCD开发了中国国内第一台真空蚀刻机，蚀刻室内加装真空水刀，从根本上解决了水池效应，蚀刻因子提高到4。0以上。
- This machine has flood bar and rinsing system in etching chamber,etching effect is greatly improved,and it is good for processing PCB with fine circuit. 蚀刻室内配置水刀和浸泡系统，保证减铜均匀，使制作精细线路成为可能。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- This thesis considers the delamination behaviors between substrate and molding compound for Ball Grid Array (BGA) products caused by the plasma etching process. 中文摘要本文针对阵列锡球封装产品基板和胶饼间所产生的分层作研究。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating.The performance is evaluated by measuring the reflectance spectrum and contact angle. 实验上，我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片，并量测该试片的反射频谱和接触角。
- Abstract: The characteristics and progress of lithography technique and plasma etching technology are summarized.Their physical mechanisms and current research problems are also explained. 文摘:介绍了光刻与等离子体刻蚀技术的特点与进展，阐述了等离子体刻蚀的物理机制与前沿问题.
- An in-situ particle monitor was installed on a plasma etch tool chamber.This article includes a discussion of two major problems detected on the plasma etch tool within a three-week period. 在等离子体蚀刻工具主舱内安装一个现场粒子监测器,对两个主要问题进行了三周的测试并展开了讨论。
- The Research on Plasma Etching Photoresists 等离子体腐蚀去胶的探讨
- LITHOGRAPHY AND PLASMA ETCHING TECHNOLOGY 光刻与等离子体刻蚀技术
- inductively coupled plasma etching 电感耦合等离子体刻蚀
- radial flow plasma etching reactor 径向两等离子体腐蚀装置
- The members left the council chamber. 议员们离开了会议厅。
- Both of them are nuts about chamber music. 他们两人都喜欢室内音乐。
- The proposed methodologies are applied to detection and classification faults for a particular tool function of a plasma etcher in semiconductor fabrication. 针对所提出的方法，实际应用于半导体制造之电浆蚀刻的机台参数的错误侦测及鑑别，并得之验证。
- An operation chamber should be completely sterile. 手术室应该完全无菌。
- I don't like opera; chamber music is more my style. 我不爱看歌剧，喜欢听室内乐。
- Endpoint Detection in High Density Plasma Etching System 高密度等离子体刻蚀机中的终点检测技术
