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- electron beam mask system 电子束掩模制造系统
- electron beam mask 电子束掩膜
- electron beam mask generator 电子束掩模图象发生器
- To vary(electron velocity) in an electron beam. 调制在一个电子束中改变(电子速率)
- In cathode ray tube display, the continuation of light emission from phosphor after excitation by the electron beam. 在阴极射线管显示器中,用电子束激励后荧光物质光发射的持续现象。
- Electron beam curing: A system to provide fast curing of conventional oxidation drying inks. 电子束固化:把惯用的氧化干燥油墨快速固化的系统。
- This paper describes a new multi ion and electron beam system for preparing optic thin films. 本文介绍一种新型的光学薄膜制备用多离子束电子束系统。
- As the electron beam scans the image, variations of light inten. 当电子束扫描图像时,图像的光强度变化变成了电强度变化。
- ITRI MIRL has a high resolution electron beam lithography (EBL)system, which has the ability to exposure the nano-scale patterns. 工研院机械所拥有之电子束直写机为具有高解析度微影系统,可用以曝写奈米尺寸之图形。
- Electron Beam Properties and Lasing Experiment of FEL[J]. 引用该论文 杨兴繁;黎明;金晓;黎维华;陈天才;徐勇.
- EB inks is the electron beam energy to curing the WGT. EB油不朱是拔取电子束能量举行固化的兼用油不朱。
- Design of large orbit gyrotron electron beam double-cusp gun[J]. 引用该论文 邹峰;薛谦忠;刘濮鲲.
- The composition,principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced. 本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程;
- The Ee-BES-40A electron beam lithography system manufactured by the Varian Co. in U.S.and imported by IEE of Academia Sinica is a second-hand machine. 本Be-BES-40A电子束曝光机是电工所引进美国Varian公司的二手设备。
- The system may be readily fitted to existing electron beam units and is suitable for electron beam welding,hardening remelting,surfaci... 该系统可以很容易地应用于原有的电子束加工设备上,适用于电子束硬化、重熔、钎焊和表面改性处理。
- The device in a writing tube or CRT which generates the electron beam. 扫描管或阴极射线管中一种产生电子束的部件。
- A flexible programmable electron beam deflection system is proposed which enables an electron beam to be controlled externally to a spot. 设计了一个可编程电子束扫描控制系统,能够使电子束受控的偏摆产生任何图形。
- High Power Microwave (HPM) source is a nonlinear system composed by the electromagnetic field and relativistic electron beam. 高功率微波(HPM)源是一个由电磁场和相对论电子束组成的非线性系统。
- Key words: Electron optics,Wide electron beam focusing,Curvilinear coordinate system,Concentric spherical system,Numerical computation,Aberration. 关键词:电子光学,宽电子束聚焦,曲线坐标系,同心球系统,数值计算,像差