ZnO film is developed on silicon(100) and quartz substrates using Sol-Gel technology. X-Ray Diffraction(abbreviated as XRD) result shows that all the films is in the structure of hexagonal wurtzite.

• 采用溶胶-凝胶工艺分别在 Si(100)和石英衬底上制备了 ZnO 薄膜,XRD 结果表明:ZnO 薄膜均为纤锌矿结构。