Transparent conductive,tungsten-doped indium oxide(IWO) films with the high carrier molbility were grown by magnetron sputtering on glass substrates,followed by in-situ annealing.
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释义
采用直流磁控溅射法在清洁玻璃基片上制备了掺钨氧化铟(IWO)透明导电氧化物薄膜。
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