TiO 2 thin films with the thickness of 300nm were deposited,at a total pressure of 0.80Pa in mixed O 2 and Ar atmosphere(O 2 /Ar :0.10,0.20,0.30),on SiO 2 -coated glass substrates by DC reactive magnetron sputtering.

• 在工作气压为0.；80Pa的氧氩气混合气氛下；改变氧与氩的流量比(O2/Ar:0