The relative stand deviation of relative migration time (RMT) and relative stand CL intensity of luminol were 4.6% and 12.7%, respectively.

• 在MEKC分离模式中，对于鲁米诺单组分微流控芯片分离的相对迁移时间、相对化学发光强度的相对标准偏差分别为4.；6%25和12