The photoelectrochemistry behaviour of copper electrode in buffer borax solutions (pH 9.2) containing BTA and 5CBTA was comparatively studied by using photoelectrochemistry technique.
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释义
采用光电化学方法和交流阻抗方法对不同浓度的BTA(苯并三氮唑 )和 5CBTA(5 羧基苯并三氮唑 )在硼砂缓冲溶液 (pH 9.;2 )中对铜电极的缓蚀性能作了比较研究。
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