The non-stoichiometry semi-conductive indium oxide films were prepared on glass surface using magnetron-sputtering deposition synchro-enhanced by microwave ECR plasma soure ion-implantation.
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释义
利用微波电子自旋共振等离子源离子注入增强沉积法在玻璃表面制备了非化学计量半导体氧化铟膜。
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