The morphologies and cleanness of Si (111) surface etched in several NH?4F?HCl solutions have been studied by Scanning Tunneling Microscopy (STM) and X?Ray Photoelectric Spectroscopy (XPS) .

• 利用扫描隧道显微技术(STM)和X 射线光电子能谱(XPS)技术；研究了Si(111)在几种不同比例的NH4F HCl溶液中被腐蚀后的表面形态及洁净度.