The main content of this thesis is to test and study the photoelectricproperties of a-Si:H deposited by microwave electron cyclotron resonancechemical vapor deposition (MW-ECR CVD) system.

• 本文主要对采用微波电子回旋共振化学气相沉积（MW-ECR CVD）系统制备的a-Si:H 薄膜进行了光电特性的测试研究工作。