The exposure experiments for the DCPA resist were carried out using aHenke-type X-ray source with a Carbon target(4.47nm). The etch pattern cor-responding to a 50 grooves/mm Cu net mask were obtained by continuous expo-sure.

• 采用安装C靶（4.；47nm）的Henke源进行了DCPA胶的X光曝光实验，经持续曝光，得到了与50线/mm铜网掩模对应的光刻图形。