The ZrCl4, HfCl4, and SiCl4 were used as the sol-gel precursors to form the hafnium and zirconium silicate after rapid thermal annealing at high temperature.

• 我们以四氯化锆、四氯化铪及四氯化矽为溶胶-凝胶溶液之前驱物，旋转涂布于晶圆上形成薄膜，经高温退火后形成含有锆及铪之金属矽氧化物。