The Ti-doped WO_3 films were characterized with X-ray diffraction (XRD),Raman spectroscopy,ultraviolet spectrophotometer,chronoamperometry and atomic force microscopy (AFM) .

• 运用X射线衍射(XRD),拉曼光谱、紫外分光光度计、计时安培分析仪和原子力显微镜(AFM)等测试手段分析了钛掺杂WO_3薄膜的结构和光学性能。