Siwafers annealed by CW-CO2 laser have been studied using Nomarski technique, electron absorption image, IR spectrum, AES and ESCA, with particular emphasis on the study of in-depth oxygen contamination.

• 利用相衬显微术、电子吸收像、IR光谱、AES和ESCA谱研究了硅片经CW CO_2激光退火后的一些特征,其中着重分析氧的深度沾污问题。