RF Plasma System 9200 is a barrel-type batch stripping system with optional high temperature capabilities for photoresist removal, nitride etch, and other cleaning applications in semiconductor and MEMS fabs.

• 射频等离子体9200是桶式炉脱模体；拥有可控制的高温系统可去除光阻材料、氮化物蚀刻和半导体与微型机电系统等方面的清洗功能.