Nitrogen doped fluorinated diamond-like carbon(FN-DLC)thin films is deposited using radio frequency plasma enhanced chemical vapor deposition under different radio-frequency power with CF_4,CH_4 and N_2 as source gases.

• 以CF4；CH4和N2为源气体；采用射频等离子体增强化学气相沉积法；在不同射频功率下制备了含氮氟化类金刚石薄膜样品.