It need precisely control deposition parameters for prepared high-quality VO2 films, because it has complex of V-O valence configuration and similar of formation condition of many vanadium oxides.
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但因V-O价态结构复杂,许多氧化钒的形成条件又比较相近,想制备高质量的VO2薄膜,必须严格控制制备工艺参数。
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