It is found that the plasma resistancereduced with the increase of discharge voltage and repetitive frequency, but increased with enhancing buffer gas pressure.

• 测量了放电等离子体阻抗随放电电压、频率以及气体压强之间的变化关系,表明等离子体阻抗随频率和电压的增加而下降,随气压的升高而增大。