Increase the density of side gas nozzles for AMAT HDP system can improve the HDP within wafer thickness uniformity.

• 首先，基于AMAT HDP设备平台，研究发现增加侧壁气体喷嘴数目和将顶部喷嘴从单方向改为四方向均对改善HDP薄膜均匀性有显著的效果。