In order to expand the kind of backing material and produce thick film (>50um) of low inner stress and other high performance film, a pulsed negative bias voltage technique is using in the AIP craft along with the developing of pulsed power technology.

• 为了扩大电弧离子镀的基材范围和用电弧离子镀设备制备出内应力较低的更厚镀层以及其它类型应用的高性能镀层，随着脉冲功率技术的发展，一种脉冲负偏压工艺开始用于电弧离子镀技术。