In TEM results, we find that H2 process lead to stronger indium confinement in the well layers and can suppress the spinodal decomposition in the rim part of the wafer.

• 在高解析度穿透式电子显微术结果中，我们发现经由氢气的处理，铟原子主要局限于井层，同时也减轻晶圆的边缘处的铟密集的效应。