Imaging Interferometric Lithography (IIL) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system.

• 摘要掩模投影成像干涉光刻技术以在很小或几乎不增加光刻系统成本的基础上来提高光刻分辨率为目的，充分利用系统的有限孔径，将掩模图形不同的空间频率分别进行传递，最终以高分辨率对掩模成像。