Imaging Interferometric Lithography (IIL) has high resolution of interferometric lithography (IL) and ability for printing arbitrary patterns of optical lithography (OL).

• 摘要成像干涉光刻技术(IIL)具有干涉光刻技术(IL)的高分辨力和光学光刻技术(OL)产生任意形状集成电路特征图形的能力。