ITO films were prepared by r.f. magnetron sputtering, and were annealed in ammonia, nitrogen and air atmosphere respectively.

• 利用射频磁控溅射在室温玻璃衬底上制备了氧化铟锡(ITO)薄膜,并分别在氨气、氮气和空气气氛下对薄膜进行了热处理。