Hence, we deposited 7.5nm and 15nm LT-AlN as buffer layers on two samples, trying to make improvement on lattice quality.

• 因此，我们将两个试片分别镀上7.；5奈米及15奈米厚度的氮化铝作为缓冲层，看看是否能对于晶体品质上有实质上的帮助。