For sputtered HfOxNy thin film, the EOT decreases with increasing the PDA temperature and time, whereas the hysteresis width is increased.

• 对于使用溅镀方式沉积的氮氧化铪薄膜，随著热退火温度的升高跟时间的延长，得到的等效氧化层厚度皆会下降，但也同时导致迟滞的增加。