DLC and fluorinated DLC were deposited by enclosed unbalanced magnetron sputtering using C 2H 2 as a reactive gas and C 2F 2 as a fluorine source gas.
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释义
使用非平衡磁控溅射方法,以C2H2为反应气,C2F2为氟化气沉积了含氟和不含氟的类金刚石(DLC)薄膜。
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