According to the technical process of ion beam etching on Diffractive Optical Element (DOE), a distribution of surface error in ion beam etching was presented.

• 摘要针对衍射光学元件(DOE)的离子束刻蚀工艺，结合掩模套刻过程实例，本文提出了刻蚀误差面形分布的概念。