AES and ESCA has been applied to the analysis of the superconducting Nb-Ge film which were deposited onto sapphire substrate by a low-energy sputtering technique.

• 利用表面分析仪器俄歇电子能谱(AES)仪和电子能谱化学分析(ESCA)仪对超导Nb-Ge溅射膜进行表面和深度剖面分析,以探讨在溅射沉积成膜过程中A15结构Nb_3Ge能够稳定生长的机制,以及影响其转变温度T_c的因素。